DocumentCode
3611883
Title
Charge Collection Mechanisms in GaAs MOSFETs
Author
Kai Ni ; En Xia Zhang ; Samsel, Isaak K. ; Schrimpf, Ronald D. ; Reed, Robert A. ; Fleetwood, Daniel M. ; Sternberg, Andrew L. ; McCurdy, Michael W. ; Shufeng Ren ; Tso-Ping Ma ; Ling Dong ; Jing Yun Zhang ; Ye, Peide D.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA
Volume
62
Issue
6
fYear
2015
Firstpage
2752
Lastpage
2759
Abstract
Charge collection mechanisms are investigated in surface channel GaAs MOSFETs under broadbeam heavy ion irradiation and pulsed two-photon-absorption laser irradiation. The large barrier between the gate dielectric and GaAs eliminates gate conduction current, but there is significant gate displacement current. Charge enhancement occurs because radiation-generated holes accumulate in the substrate, which increases the local electrostatic potential. The increased potential enhances the source-to-drain current, resulting in excess collected charge. The collected charge increases significantly with gate bias, due to the long tails of the charge waveforms that occur for higher gate bias. The collected charge increases with increasing drain bias.
Keywords
III-V semiconductors; MOSFET; gallium arsenide; ion beam effects; laser beam effects; GaAs; MOSFET; broadbeam heavy ion irradiation; charge collection mechanism; charge enhancement; drain bias; gate dielectric; gate displacement current; pulsed two-photon absorption laser irradiation; Design automation; Gallium arsenide; Indium gallium arsenide; Ion radiation effects; MOSFET; Single event transients; Charge collection; GaAs; III-V; InGaAs; MOSFETs; ion radiation effects; single-event transient; technology computer-aided design (TCAD); two-photon- absorption (TPA);
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2015.2495203
Filename
7348789
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