3614719

Lattice stress gradient formation in oxide films deposited on substrates when used sputtering techniques

P. Sutta

Military Academy

2002

6/24/1905 12:00:00 AM

139

142

"Lattices","Sputtering","Zinc oxide","Optical films","Substrates","Semiconductor films","Capacitive sensors","Residual stresses","X-ray diffraction","Optical devices"

ieee

Semiconducting and Insulating Materials, 2002. SIMC-XII-2002. 12th International Conference on

0-7803-7418-5

conf

10.1109/SIM.2002.1242742

1242742