Title :
Improvements in photo-plot based reticle fabrication
Author_Institution :
Nat. Inst. for R&D in Microtechnologies - IMT, Bucharest, Romania
fDate :
6/25/1905 12:00:00 AM
Abstract :
The paper reports on the specific problems occurring at photo-plot type reticles used in mask fabrication for the microtechnology field. The basic limitations of this cheap way to obtain masks for rapid prototyping in micro-optics, microelectronics and micromechanics are pointed out. New methods, applied by the author, to optimize the photo-plot based reticle fabrication are proposed, too.
Keywords :
"Optical device fabrication","Laser beams","Buffer storage","Optical films","Writing","Laser theory","Research and development","Paper technology","Prototypes","Microelectronics"
Conference_Titel :
Semiconductor Conference, 2003. CAS 2003. International
Print_ISBN :
0-7803-7821-0
DOI :
10.1109/SMICND.2003.1251371
