3619165

Trends and challenges in VLSI technology scaling towards 100nm

S. Rusu

Intel Corporation, Santa Clara, CA

2001

6/23/1905 12:00:00 AM

194

196

"Very large scale integration","MOSFETs","Subthreshold current","Moore´s Law","Lithography","Integrated circuit interconnections","Ultraviolet sources","Delay","Frequency","Degradation"

ieee

Solid-State Circuits Conference, 2001. ESSCIRC 2001. Proceedings of the 27th European

conf

1471366