DocumentCode :
3619458
Title :
Enhancement of TFT Performance by Low Temperature Oxygen Annealing
Author :
P.T. Baine;L.J. Quinn;B. Lee;S.J.N. Mitchell;B.M. Armstrong;H.S. Gamble
Author_Institution :
Northern Ireland Semicon. Res. Cen, UK
fYear :
1997
fDate :
6/19/1905 12:00:00 AM
Firstpage :
688
Lastpage :
691
Keywords :
"Thin film transistors","Oxygen","Annealing","Plasma temperature","Dielectric substrates","Glass","Silicon compounds","Grain size","Electric variables","Flat panel displays"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
Type :
conf
DOI :
10.1109/ESSDERC.1997.194522
Filename :
1503452
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3619458
