DocumentCode :
3619486
Title :
In-line charging monitoring with Plasma Damage Monitor for ion implantation processing
Author :
A.S. Bloot;E.H.J. Satink;A. Cacciato
Author_Institution :
Philips Semiconductors, Nijmegen, Netherlands
fYear :
1998
fDate :
6/20/1905 12:00:00 AM
Firstpage :
560
Lastpage :
563
Keywords :
"Monitoring","Plasma immersion ion implantation","Plasma materials processing","Ion implantation","EPROM","Surface charging","CMOS technology","Electron emission","Plasma measurements","Ion beams"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Print_ISBN :
2-86332-234-6
Type :
conf
Filename :
1503613
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3619486
