• DocumentCode
    3619486
  • Title

    In-line charging monitoring with Plasma Damage Monitor for ion implantation processing

  • Author

    A.S. Bloot;E.H.J. Satink;A. Cacciato

  • Author_Institution
    Philips Semiconductors, Nijmegen, Netherlands
  • fYear
    1998
  • fDate
    6/20/1905 12:00:00 AM
  • Firstpage
    560
  • Lastpage
    563
  • Keywords
    "Monitoring","Plasma immersion ion implantation","Plasma materials processing","Ion implantation","EPROM","Surface charging","CMOS technology","Electron emission","Plasma measurements","Ion beams"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1998. Proceeding of the 28th European
  • Print_ISBN
    2-86332-234-6
  • Type

    conf

  • Filename
    1503613
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619486