DocumentCode :
3619489
Title :
A Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET´s Flicker Noise Properties
Author :
R. Sachdev;G. Wijeratne;V. Ramgopal Rao;C.R. Viswanathan
Author_Institution :
University of California, Los Angeles, United States
fYear :
1998
fDate :
6/20/1905 12:00:00 AM
Firstpage :
572
Lastpage :
575
Keywords :
"Plasma properties","Plasma applications","Etching","MOSFET circuits","1f noise","Plasma measurements","Plasma materials processing","Noise measurement","Noise figure","Plasma devices"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Print_ISBN :
2-86332-234-6
Type :
conf
Filename :
1503616
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3619489
