• DocumentCode
    3619489
  • Title

    A Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET´s Flicker Noise Properties

  • Author

    R. Sachdev;G. Wijeratne;V. Ramgopal Rao;C.R. Viswanathan

  • Author_Institution
    University of California, Los Angeles, United States
  • fYear
    1998
  • fDate
    6/20/1905 12:00:00 AM
  • Firstpage
    572
  • Lastpage
    575
  • Keywords
    "Plasma properties","Plasma applications","Etching","MOSFET circuits","1f noise","Plasma measurements","Plasma materials processing","Noise measurement","Noise figure","Plasma devices"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1998. Proceeding of the 28th European
  • Print_ISBN
    2-86332-234-6
  • Type

    conf

  • Filename
    1503616
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619489