3619496

Impact of Premetal process on the 0.25 um device performances

N.H. Loof;K. Barla;B. Descouts;J. Geulen;C. Verove;M. Ada-Hanifi

Philips Semiconductors, Netherlands

1998

6/20/1905 12:00:00 AM

600

603

"Etching","Silicon","Boron","Integrated circuit interconnections","Chemistry","MOSFET circuits","Degradation","Telecommunications","Logic circuits","Chemical technology"

ieee

Solid-State Device Research Conference, 1998. Proceeding of the 28th European

2-86332-234-6

conf

1503623