• DocumentCode
    3619543
  • Title

    Identification of Critical Parameters for Plasma Process-Induced Damage in 130 and 100 nm CMOS Technologies

  • Author

    G. Van den Bosch;B. De Jaeger;Z. Tokei;G. Groeseneken

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    2002
  • fDate
    6/24/1905 12:00:00 AM
  • Firstpage
    271
  • Lastpage
    274
  • Keywords
    "CMOS technology","CMOS process","Leakage current","Gate leakage","Copper","Dielectrics","Plasma confinement","Plasma temperature","Temperature sensors","Aluminum"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
  • Print_ISBN
    88-900847-8-2
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2002.194922
  • Filename
    1503852
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619543