DocumentCode
3619553
Title
Highly Extendible Memory Cell Architecture for Reliable Data Retention Time for 0.10mm Technology Node and beyond
Author
J. Lee;C. Cho;J. Lee;S. Shin;J.-W. Lee;K. Kwak;K. Lee;B. Roh;T. Chung;K. Kim
Author_Institution
Samsung Electronics Co., Yongin-City, Kyungki-Do, Korea (South)
fYear
2002
fDate
6/24/1905 12:00:00 AM
Firstpage
571
Lastpage
574
Keywords
"Memory architecture","Random access memory","Leakage current","Surface cleaning","Capacitors","Space technology","Etching","Dielectrics","Doping","Capacitance"
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN
88-900847-8-2
Type
conf
DOI
10.1109/ESSDERC.2002.194995
Filename
1503925
Link To Document