3619555

Influence of Doping Profile and Halo Implantation on the Threshold Voltage Mismatch of a 0.13um CMOS Technology

J.A. Croon;E. Augendre;S. Decoutere;W. Sansen;H.E. Maes

IMEC, Belgium and KU Leuven, Belgium

2002

6/24/1905 12:00:00 AM

579

582

"CMOS technology","Doping profiles","Threshold voltage","Fluctuations","Implants","Permittivity","Poisson equations","Statistics","Capacitance","Degradation"

ieee

Solid-State Device Research Conference, 2002. Proceeding of the 32nd European

88-900847-8-2

conf

10.1109/ESSDERC.2002.194997

1503927