DocumentCode :
3619556
Title :
Impact of ALCVD and PVD Titanium Nitride Deposition on Metal Gate Capacitors
Author :
G. Lujan;T. Schram;L. Pantisano;J. Hooker;S. Kubicek;E. Rohr;J. Schuhmacher;O. Kilpela;H. Sprey;S. De Gendt;K. De Meyer
Author_Institution :
IMEC, Leuven, Belgium
fYear :
2002
fDate :
6/24/1905 12:00:00 AM
Firstpage :
583
Lastpage :
586
Keywords :
"Atherosclerosis","Titanium","Capacitors","Tin","Electrodes","High-K gate dielectrics","Data mining","Capacitance measurement","High K dielectric materials","Chemical vapor deposition"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
Type :
conf
DOI :
10.1109/ESSDERC.2002.194998
Filename :
1503928
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3619556
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