• DocumentCode
    3619557
  • Title

    Stability of High-k Thin Films in Moisture Ambience - The Effect of Dissolution Gas from Acryl Apparatus -

  • Author

    S. Akama;A. Kikuchi;J. Tonotani;S.-I. Ohmi;H. Iwai

  • Author_Institution
    Tokyo Institute of Technology, Japan
  • fYear
    2002
  • fDate
    6/24/1905 12:00:00 AM
  • Firstpage
    587
  • Lastpage
    590
  • Keywords
    "Stability","High K dielectric materials","High-K gate dielectrics","Transistors","Moisture","Testing","Absorption","Degradation","Leakage current","Electrodes"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
  • Print_ISBN
    88-900847-8-2
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2002.194999
  • Filename
    1503929
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619557