DocumentCode :
3619658
Title :
Modeling Facet Formation for Non-Planar Thermal Oxidation of Silicon
Author :
V. Moroz;C. Dachs;A. Schoonveld
Author_Institution :
Avant! Corporation, Fremont, USA
fYear :
2001
fDate :
6/23/1905 12:00:00 AM
Firstpage :
371
Lastpage :
374
Keywords :
"Oxidation","Silicon","Shape measurement","Crystallography","MOSFET circuits","Monitoring","Stress","Anisotropic magnetoresistance","Leakage current","Thermal degradation"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
Type :
conf
DOI :
10.1109/ESSDERC.2001.195278
Filename :
1506660
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3619658
