3619663

Characterization of ultra thin high K gate dielectrics by grazing x-ray reflectance and Spectroscopic Ellipsometry on the same instrument

P. Boher;J.-L. Stehle;C. Defranoux;S. Bourtault;J.-P. Piel;P. Evrard

SOPRA SA, Bois-Colombes, France

2001

6/23/1905 12:00:00 AM

391

394

"High K dielectric materials","High-K gate dielectrics","Reflectivity","Electrochemical impedance spectroscopy","Ellipsometry","Instruments","Optical films","Optical refraction","Optical sensors","Silicon"

ieee

Solid-State Device Research Conference, 2001. Proceeding of the 31st European

2-914601-01-8

conf

10.1109/ESSDERC.2001.195283

1506665