• DocumentCode
    3621551
  • Title

    CMOS and interconnect reliability process and electrical degradation in flash memories and performance boosted CMOS devices

  • Author

    A. Visconti;W. Tonti

  • fYear
    2005
  • fDate
    6/27/1905 12:00:00 AM
  • Firstpage
    538
  • Lastpage
    538
  • Keywords
    "CMOS process","Degradation","Flash memory","Microelectronics","MOSFETs","Reliability engineering","CMOS technology","Paper technology","Photonic band gap","Tunneling"
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International
  • Print_ISBN
    0-7803-9268-X
  • Type

    conf

  • DOI
    10.1109/IEDM.2005.1609401
  • Filename
    1609401
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3621551