مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

3621572

Title :

IIRW 2005 Discussion Group Summary: NBTI

Author :

J. Campbell;C. Parthasarathy

Author_Institution :

Pennsylvania State University

fYear :

2005

fDate :

6/27/1905 12:00:00 AM

Firstpage :

170

Lastpage :

170

Keywords :

"Niobium compounds","Titanium compounds","Stress measurement","Dielectrics","Degradation","Hydrogen","MOSFET circuits","Threshold voltage","Measurement techniques","Negative bias temperature instability"

Publisher :

ieee

Conference_Titel :

Integrated Reliability Workshop Final Report, 2005 IEEE International

Print_ISBN :

0-7803-8992-1

Type :

conf

DOI :

10.1109/IRWS.2005.1609597

Filename :

1609597

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3621572