• DocumentCode
    3621659
  • Title

    Ultra low temperature NISI processing

  • Author

    A. Hunter;C. Tanasa;R. Ramanujam;A. Tang;N. Tam;B. Ramachandran;R. Achutharaman;S. Ramamurthy;J. Ranish

  • Author_Institution
    Applied Materials Inc., Santa Clara, California 95054
  • fYear
    2005
  • fDate
    6/27/1905 12:00:00 AM
  • Firstpage
    175
  • Lastpage
    175
  • Abstract
    Manuscript not released forpublication due to legal issues.
  • Keywords
    Temperature
  • Publisher
    ieee
  • Conference_Titel
    Advanced Thermal Processing of Semiconductors, 2005. RTP 2005. 13th IEEE International Conference on
  • Print_ISBN
    0-7803-9223-X
  • Type

    conf

  • DOI
    10.1109/RTP.2005.1613705
  • Filename
    1613705
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3621659