DocumentCode :
3622134
Title :
Silicon Surface Exfoliation under Compression Plasma Flow Action
Author :
I.P. Dojcinovic;M.M. Kuraica;D. Randjelovic;M. Matic;J. Puric
Author_Institution :
Fac. of Phys., Belgrade Univ.
fYear :
2006
fDate :
6/28/1905 12:00:00 AM
Firstpage :
137
Lastpage :
140
Abstract :
Silicon single crystal surfaces have been modified by supersonic compression plasma flows (CPF) action. Triangular and rhombic regular fracture features are obtained on the Si (111), while rectangular ones are produced on Si (100) surface. Some of these regular structures can become free from the underlying bulk, formed as blocks ejected from the surface. Surface cleavage and exfoliation phenomena as the results of specific conditions during CPF interaction on silicon surface are, also, observed. Such conditions are the results of rapid heating and melting of surface layer, long existence of molten layer (~40 mus) and fast cooling and recrystalisation taking place under the high dynamic pressure and thermodynamic parameters gradients
Keywords :
"Silicon","Plasmas","Surface cracks","Surface treatment","Magnetic materials","Photonic crystals","Surface emitting lasers","Semiconductor materials","Optical pulses","Laser beams"
Publisher :
ieee
Conference_Titel :
Microelectronics, 2006 25th International Conference on
Print_ISBN :
1-4244-0117-8
Type :
conf
DOI :
10.1109/ICMEL.2006.1650915
Filename :
1650915
Link To Document :
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