• DocumentCode
    3623192
  • Title

    Series resistance and effective gate length extraction on short-channel PMOS devices at liquid nitrogen temperature

  • Author

    F.J. Garcia Sanchez;A. Ortiz-Conde;M. Garcia Nunez;R.L. Anderson

  • Author_Institution
    Dept. de Electron., Simon Bolivar Univ., Caracas, Venezuela
  • fYear
    1994
  • Firstpage
    190
  • Lastpage
    194
  • Abstract
    A simple method is presented which allows to extract the effective channel length and the gate voltage dependent series resistance of p-channel MOSFETs at low temperature. The method is used on devices with mask channel lengths from 0.6 to 2.0 /spl mu/m, operating at room and at liquid nitrogen temperatures, and it is compared with conventional methods. The series resistance decreases and the effective channel length increases in these devices when the temperature is lowered from 300 to 77 K.
  • Keywords
    "MOS devices","Nitrogen","Temperature dependence","MOSFETs","Surface resistance","Threshold voltage","Laboratories","Semiconductor device modeling","Parameter extraction","Subthreshold current"
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1994. ICMTS 1994. Proceedings of the 1994 International Conference on
  • Print_ISBN
    0-7803-1757-2
  • Type

    conf

  • DOI
    10.1109/ICMTS.1994.303478
  • Filename
    303478