DocumentCode
3623192
Title
Series resistance and effective gate length extraction on short-channel PMOS devices at liquid nitrogen temperature
Author
F.J. Garcia Sanchez;A. Ortiz-Conde;M. Garcia Nunez;R.L. Anderson
Author_Institution
Dept. de Electron., Simon Bolivar Univ., Caracas, Venezuela
fYear
1994
Firstpage
190
Lastpage
194
Abstract
A simple method is presented which allows to extract the effective channel length and the gate voltage dependent series resistance of p-channel MOSFETs at low temperature. The method is used on devices with mask channel lengths from 0.6 to 2.0 /spl mu/m, operating at room and at liquid nitrogen temperatures, and it is compared with conventional methods. The series resistance decreases and the effective channel length increases in these devices when the temperature is lowered from 300 to 77 K.
Keywords
"MOS devices","Nitrogen","Temperature dependence","MOSFETs","Surface resistance","Threshold voltage","Laboratories","Semiconductor device modeling","Parameter extraction","Subthreshold current"
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 1994. ICMTS 1994. Proceedings of the 1994 International Conference on
Print_ISBN
0-7803-1757-2
Type
conf
DOI
10.1109/ICMTS.1994.303478
Filename
303478
Link To Document