DocumentCode :
3624069
Title :
The Negative Bias Temperature Instability in MOS Devices
Author :
Sufi Zafar
Author_Institution :
IBM
fYear :
2006
Firstpage :
217
Lastpage :
217
Keywords :
"Negative bias temperature instability","MOS devices","Titanium compounds","Electromigration","Electronic design automation and methodology","Degradation","CMOS technology","Integrated circuit reliability"
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2006 IEEE International
ISSN :
1930-8841
Print_ISBN :
1-4244-0296-4
Electronic_ISBN :
2374-8036
Type :
conf
DOI :
10.1109/IRWS.2006.305255
Filename :
4098732
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3624069
