DocumentCode
3631458
Title
Thick film LC and LCV cell arrays
Author
O.S. Aleksic;P.M. Nikolic;M.D. Lukovic;J.Z. Nikolic;Z. Preradovic;J. Pavlovic;V.Z. Pejovic
Author_Institution
Joint Lab. for Adv. Mater., Beograd, Yugoslavia
Volume
1
fYear
1995
Firstpage
85
Abstract
A few types of thick film integrated LC cells were created based on planar inductors and capacitors. The planar thick film inductors such as meander and bispiral were integrated into the top electrodes of the planar thick film capacitors such as sandwich and interdigitated to form thick film LC cells. Thick film planar LC arrays were made by repeating the 3, 4 or 8 LC cells on the same substrate. The two dielectric pastes made in EI Iritel were used for planar cell arrays: BaTiO/sub 3/ for planar LC and ZnO for planar LCV cells (V varistor is built in capacitor). Electrodes were printed using PdAg paste. NiFe/sub 2/O/sub 4/ paste made in EI Ferrites and EI Iritel was printed on the bottom and the top of LC cells to increase the inductivity L. These arrays were aimed to serve as planar EMI/RFI suppressors of radiative noise on I/O connections. The main advantages of these cell arrays over the classical ones are: custom design, new geometries with distributed L/C/V, built in planar varistors, easy reproduction, DIL package etc.
Keywords
"Thick films","Capacitors","Thick film inductors","Electrodes","Dielectric substrates","Varistors","Zinc oxide","Data structures","Boolean functions","Ferrites"
Publisher
ieee
Conference_Titel
Microelectronics, 1995. Proceedings., 1995 20th International Conference on
Print_ISBN
0-7803-2786-1
Type
conf
DOI
10.1109/ICMEL.1995.500841
Filename
500841
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