The optical properties of hafnium oxide prepared by the pulsed laser deposition

Thin films of hafnium oxide (HfO2) have been grown by PLD method on transparent quartz substrates. The HfO2 target used in our experiment was made by pressing HfO2 powder. A XeCl excimer laser (EXC 150, ESTLA, 308 nm in wavelength, 20 ns in pulse width) running at 10 Hz with an average pulse energy of about 200 mJ was used. The films were characterized using X-ray diffraction. The films were amorphous, stoichiometric, and transparent down to a wavelength of 300 nm. Optical properties of the films (refractive index, the absorption index and the bandgap) were investigated by transmittance in the ultraviolet, visible and near infrared range and photoluminescence spectroscopy. We measure the photoluminescence spectra and dynamics of luminescence process.