• DocumentCode
    3636440
  • Title

    Optimizing the cleaning process through cleaning efficiency examination

  • Author

    Vladimir Sitko;Michal Saffer;Ivan Szendiuch;Martin Bursik

  • Author_Institution
    Pbt Rož
  • fYear
    2008
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    The paper explores the efficiency of cleaning methods in order to select a method and optimize cleaning as a part of assembly manufacturing process in microelectronics. To find out the advantages and potentialities of each single cleaning method it is necessary to use simple but reliable evaluation method. In this paper are under consideration two different methods for contamination evaluation, the first being the standard one using the contaminometer, and the second, new one, which is developed on an optical principle. The new method for cleaning evaluation is based on measuring the contamination in special substrate pattern using a scanning unit (programmable automated optical inspection). The special pattern was designed and realized on a glass substrate with ceramic chip models. The experimental part presents the efficiency examination and compares ultrasonic cleaning in microemulsion to other methods like spray in the air etc. The results of this study are used in optimizing and adjusting cleaning equipments as well as in their improvement and innovation.
  • Keywords
    "Cleaning","Contamination","Automatic optical inspection","Optimization methods","Assembly","Manufacturing processes","Microelectronics","Standards development","Pollution measurement","Semiconductor device measurement"
  • Publisher
    ieee
  • Conference_Titel
    Electronic Manufacturing Technology Symposium (IEMT), 2008 33rd IEEE/CPMT International
  • ISSN
    1089-8190
  • Print_ISBN
    978-1-4244-3392-6
  • Type

    conf

  • DOI
    10.1109/IEMT.2008.5507814
  • Filename
    5507814