DocumentCode
3637738
Title
The equipment for measuring of concentration profiles using the spreading resistance method
Author
J. Hybler;V. Svagr
Author_Institution
Czech Tech. Univ., Prague, Czech Republic
Volume
2
fYear
1996
Firstpage
339
Abstract
The equipment for measuring of concentration profiles in semiconductor structures using the spreading resistance method has been developed. Device is designed for measuring local contact resistance in range from 1/spl Omega/ to 10M/spl Omega/ with high level of accuracy. Resistance is measured under conditions of dc constant current with measured contact voltage below 10 mV. The stepping of the sample holder and the measuring pin movement (down and up) and data collection and processing are fully controlled by the PC.
Keywords
"Electrical resistance measurement","Conductivity","Contact resistance","Area measurement","Thickness measurement","Testing","Data processing"
Publisher
ieee
Conference_Titel
Semiconductor Conference, 1996., International
Print_ISBN
0-7803-3223-7
Type
conf
DOI
10.1109/SMICND.1996.557390
Filename
557390
Link To Document