• DocumentCode
    3637738
  • Title

    The equipment for measuring of concentration profiles using the spreading resistance method

  • Author

    J. Hybler;V. Svagr

  • Author_Institution
    Czech Tech. Univ., Prague, Czech Republic
  • Volume
    2
  • fYear
    1996
  • Firstpage
    339
  • Abstract
    The equipment for measuring of concentration profiles in semiconductor structures using the spreading resistance method has been developed. Device is designed for measuring local contact resistance in range from 1/spl Omega/ to 10M/spl Omega/ with high level of accuracy. Resistance is measured under conditions of dc constant current with measured contact voltage below 10 mV. The stepping of the sample holder and the measuring pin movement (down and up) and data collection and processing are fully controlled by the PC.
  • Keywords
    "Electrical resistance measurement","Conductivity","Contact resistance","Area measurement","Thickness measurement","Testing","Data processing"
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 1996., International
  • Print_ISBN
    0-7803-3223-7
  • Type

    conf

  • DOI
    10.1109/SMICND.1996.557390
  • Filename
    557390