DocumentCode
3640015
Title
N-doped GeTe as performance booster for embedded Phase-Change Memories
Author
A. Fantini;V. Sousa;L. Perniola;E. Gourvest;JC Bastien;S. Maitrejean;S. Braga;N. Pashkov;A. Bastard;B. Hyot;A. Roule;A. Persico;H. Feldis;C. Jahan;JF Nodin;D. Blachier;A. Toffoli;G. Reimbold;F. Fillot;F. Pierre;R. Annunziata;D. Benshael;P. Mazoyer;C. Vall
Author_Institution
CEA-LETI, MINATEC, 17, Rue des Martyrs, 38054 Grenoble, France
fYear
2010
Abstract
The commercialization of Phase-Change Memories (PCM), based on the well-known GST compound, have been recently started, tailored for consumer applications. Despite other excellent performances (i.e. low-power, scalability,…), data retention is assured up to 85°C, still limited for the automotive market segment. Alternative active material able to comply with the stringent requirements of automotive applications should possibly exhibit higher crystallization temperature (TC ) as well as higher Activation Energy (EA ) with respect to GST. Recent literature shows that GeTe provides better retention [1–3], while several works put in evidence how data retention is enhanced by inclusions in pure host alloys [4–6].
Keywords
"Temperature measurement","Crystallization","Metals","Resistance","Phase change memory","Doping"
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2010 IEEE International
ISSN
0163-1918
Print_ISBN
978-1-4424-7418-5
Electronic_ISBN
2156-017X
Type
conf
DOI
10.1109/IEDM.2010.5703441
Filename
5703441
Link To Document