• DocumentCode
    3640015
  • Title

    N-doped GeTe as performance booster for embedded Phase-Change Memories

  • Author

    A. Fantini;V. Sousa;L. Perniola;E. Gourvest;JC Bastien;S. Maitrejean;S. Braga;N. Pashkov;A. Bastard;B. Hyot;A. Roule;A. Persico;H. Feldis;C. Jahan;JF Nodin;D. Blachier;A. Toffoli;G. Reimbold;F. Fillot;F. Pierre;R. Annunziata;D. Benshael;P. Mazoyer;C. Vall

  • Author_Institution
    CEA-LETI, MINATEC, 17, Rue des Martyrs, 38054 Grenoble, France
  • fYear
    2010
  • Abstract
    The commercialization of Phase-Change Memories (PCM), based on the well-known GST compound, have been recently started, tailored for consumer applications. Despite other excellent performances (i.e. low-power, scalability,…), data retention is assured up to 85°C, still limited for the automotive market segment. Alternative active material able to comply with the stringent requirements of automotive applications should possibly exhibit higher crystallization temperature (TC) as well as higher Activation Energy (EA) with respect to GST. Recent literature shows that GeTe provides better retention [1–3], while several works put in evidence how data retention is enhanced by inclusions in pure host alloys [4–6].
  • Keywords
    "Temperature measurement","Crystallization","Metals","Resistance","Phase change memory","Doping"
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    2156-017X
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703441
  • Filename
    5703441