Title :
Low-loss polysilicon waveguides suitable for integration within a high-volume electronics process
Author :
Jason S. Orcutt;Sanh D. Tang;Steve Kramer;Hanqing Li;Vladimir Stojanović;Rajeev J. Ram
Author_Institution :
Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139
fDate :
5/1/2011 12:00:00 AM
Abstract :
Polysilicon waveguides are fabricated in a 300 mm wafer process representative of a complete high-volume electronic memory process. 6.2 dB/cm end-of-line loss is measured for narrow waveguides with a confinement factor scaling of 5.1 cm-1.
Keywords :
"Optical waveguides","Propagation losses","Loss measurement","Optical losses","Materials","Surface roughness","Rough surfaces"
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2011 Conference on
Print_ISBN :
978-1-4577-1223-4
DOI :
10.1364/CLEO_SI.2011.CThHH2
