Laser ablation and thin film deposition

Laser ablation is the process of removing material from a solid surface by irradiating it with a laser beam. At low laser flux, the material is heated by the absorbed laser energy and evaporates or sublimates. At high laser flux, the material is typically converted to a plasma. Usually, laser ablation refers to removing material with a pulsed laser, that´s why is also called pulsed laser deposition (PLD). This review describes some of the recent investigations in oxide´s thin film deposition technology which have led to improved understanding and control of film grown. The first part is concerned with the development of laser ablation method offering control of the energy of depositing species, which describe the link between film deposition parameters and film structures. The second part is focused on parameters described quality of the film.