DocumentCode
3645928
Title
Atomic force microscopy for low dimensional metal strips creation and measurements
Author
Maria Ramiączek-Krasowska;Adam Szyszka;Joanna Prażmowska;Regina Paszkiewicz
Author_Institution
Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego Street 11/17, 50-372 Wroclaw, Poland
fYear
2011
fDate
7/1/2011 12:00:00 AM
Firstpage
73
Lastpage
76
Abstract
In the paper the lithography methods are presented. Also a lithography with use AFM systems is summarized. In the work the reconstruction of the pattern created by nanoscratching and lift-off technique is show and discussed. The resolution of created structures for certain parameters of nanoscratching was also defined. Obtained resolution of reconstructed pattern was about 120 nm what was comparable with the thickness of gold masking layer.
Keywords
"Lithography","Metals","Force","Resists","Surface topography","Atomic force microscopy"
Publisher
ieee
Conference_Titel
Students and Young Scientists Workshop, 2011 International
ISSN
1939-4381
Print_ISBN
978-1-4577-1651-5
Type
conf
DOI
10.1109/STYSW.2011.6155848
Filename
6155848
Link To Document