• DocumentCode
    3647011
  • Title

    Simulation of current collapse in the 0.25 µm gate Length Al0.28Ga0.72N/GaN HEMT

  • Author

    S. Faramehr;K. Kalna;P. Igić

  • Author_Institution
    Electronics Systems Design Centre, College of Engineering, Swansea University, Singleton Park, Wales, United Kingdom, SA2 8PP
  • fYear
    2012
  • fDate
    5/1/2012 12:00:00 AM
  • Firstpage
    233
  • Lastpage
    236
  • Abstract
    A 2D drift-diffusion (DD) and Hydrodynamic (HD) transport models within ATLAS simulation toolbox by Silvaco have been calibrated against experimental I-V characteristics of the 0.25μm gate length GaN High Electron Mobility Transistor (HEMT). The simulations take into account both piezoelectric and spontaneous polarization effects at the interface of AlGaN and GaN. The simulations have been employed to investigate the current collapse phenomenon that plays a key role in the output characteristics of a device which can significantly limit the output power. The current collapse is investigated using shallow acceptor traps in the both AlGaN and GaN layers.
  • Keywords
    "Gallium nitride","Electron traps","HEMTs","Aluminum gallium nitride","High definition video","Logic gates"
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics (MIEL), 2012 28th International Conference on
  • ISSN
    pending
  • Print_ISBN
    978-1-4673-0237-1
  • Type

    conf

  • DOI
    10.1109/MIEL.2012.6222842
  • Filename
    6222842