DocumentCode
3647011
Title
Simulation of current collapse in the 0.25 µm gate Length Al0.28 Ga0.72 N/GaN HEMT
Author
S. Faramehr;K. Kalna;P. Igić
Author_Institution
Electronics Systems Design Centre, College of Engineering, Swansea University, Singleton Park, Wales, United Kingdom, SA2 8PP
fYear
2012
fDate
5/1/2012 12:00:00 AM
Firstpage
233
Lastpage
236
Abstract
A 2D drift-diffusion (DD) and Hydrodynamic (HD) transport models within ATLAS simulation toolbox by Silvaco have been calibrated against experimental I-V characteristics of the 0.25μm gate length GaN High Electron Mobility Transistor (HEMT). The simulations take into account both piezoelectric and spontaneous polarization effects at the interface of AlGaN and GaN. The simulations have been employed to investigate the current collapse phenomenon that plays a key role in the output characteristics of a device which can significantly limit the output power. The current collapse is investigated using shallow acceptor traps in the both AlGaN and GaN layers.
Keywords
"Gallium nitride","Electron traps","HEMTs","Aluminum gallium nitride","High definition video","Logic gates"
Publisher
ieee
Conference_Titel
Microelectronics (MIEL), 2012 28th International Conference on
ISSN
pending
Print_ISBN
978-1-4673-0237-1
Type
conf
DOI
10.1109/MIEL.2012.6222842
Filename
6222842
Link To Document