• DocumentCode
    3659166
  • Title

    Characterization of carrier dynamics in Ge quantum dots through Ge quantum-dot MOSFETs using pulsed voltage technique

  • Author

    Ming-Hao Kuo;Ho-Chane Chen;Wei-Ting Lai;Pei-Wen Li

  • Author_Institution
    Department of Electrical Engineering, National Central University, Chung Li, Taiwan, 320, Republic of China
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We demonstrated a novel CMOS approach for the fabrication of high-performance Ge quantum dot (QD) MOSFETs offering great promises as optical switches and transducers for Si-based optical interconnects. Measured photocurrent to dark current ratio (Iph/Idark) and photoresponsivities from the Ge QD PT were as high as 272,000 and 1.7 A/W, respectively, under incident power of 20 μW at 980 nm illumination. Carrier dynamics in Ge QDs were characterized by applying a depleting voltage pulse to the gate of MOSFET and by time-resolved photoluminescence on Ge QD array.
  • Keywords
    "MOSFET","Lighting","Silicon","Logic gates","Current measurement","Substrates","Oxidation"
  • Publisher
    ieee
  • Conference_Titel
    Silicon Nanoelectronics Workshop (SNW), 2015
  • Type

    conf

  • Filename
    7275300