DocumentCode :
3664743
Title :
Abnormal off-state current in multiple silicon nanowire MOS transistors
Author :
Qanqun Yu;Xuan Feng;Hei Wong;Kuniyuki Kakushima;Hiroshi Iwai
Author_Institution :
Department of Information Sciences and Electronic Engineering, Zhejiang University, Hangzhou, China
fYear :
2015
fDate :
6/1/2015 12:00:00 AM
Firstpage :
435
Lastpage :
438
Abstract :
This work reports the observation of abnormally large off-state currents in silicon nanowire transistors with gate length less than 2.5 μm. As the gate lengths as well as the source/drain doping level were well beyond the punchthrough conditions, we ascribed this observation to the charge transport along the corners/boundaries of the nanowires. Temperature dependent characteristics were also investigated. The threshold voltage decreases linearly as the temperature increases which is ascribed to the charge states at oxide/nanowire interfaces. Corner and surface of nanowire thus play an important role for ultra-short nanowire transistors and that calls for shape of nanowire optimation for device design.
Keywords :
"Logic gates","Threshold voltage","Silicon","MOSFET","Nanoscale devices"
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2015 IEEE International Conference on
Print_ISBN :
978-1-4799-8362-9
Type :
conf
DOI :
10.1109/EDSSC.2015.7285144
Filename :
7285144
Link To Document :
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