DocumentCode :
3664810
Title :
Modeling of the reverse gate leakage current of AlGaN/GaN HEMTs
Author :
Feiyang Cai;Guangrui Xia;Simon Li;Yue Fu
Author_Institution :
Department of Materials Engineering, University of British Columbia, Vancouver, Canada
fYear :
2015
fDate :
6/1/2015 12:00:00 AM
Firstpage :
697
Lastpage :
700
Abstract :
Direct tunneling and trap-assisted tunneling models are modelled and implemented into APSYS™, a device simulation tool. By comparing with experimental data, the trap-assisted tunneling model was found to better describe leakage currents than the direct tunneling model. The trap-assisted tunneling model was shown to catch the temperature dependence of the gate leakage current from 300K to 500K.
Keywords :
"Conferences","Electron devices","Solid state circuits"
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2015 IEEE International Conference on
Print_ISBN :
978-1-4799-8362-9
Type :
conf
DOI :
10.1109/EDSSC.2015.7285212
Filename :
7285212
Link To Document :
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