DocumentCode
3666470
Title
PIII in batch processing mode using HV Blumlein pulser with pulse extended to the microsecond range
Author
Ataide R. Silva;Jose O. Rossi;Mario Ueda
Author_Institution
National Institute for Space Research, Associated Plasma Laboratory, Sao Jose dos Campos, SP, Brazil
fYear
2014
fDate
6/1/2014 12:00:00 AM
Firstpage
474
Lastpage
477
Abstract
In this work, high-energy PIII process is used to solve the problem of soldering terminals to silver film electrodes without compromising their adhesion to ceramic substrates in electronic components such as ceramic capacitors. Besides, PIII batch-processing mode is other important technique used to optimize the treatment of metallic and polymeric surfaces for industrial applications such as components with rigid qualification used in the aerospace industry. For this, a sample holder made of stainless steel (SS304) with the shape of a cage allows applying the PIII processing on both faces of the flat components, simultaneously. As the batch-mode process requires increased pulse duration, the redesign of a HV Blumlein pulser was made to increase the pulse duration from 1.0 μs to 5.0 μs, but at the cost of decreasing the output voltage from 60 kV during treatment to less than 20 kV. The longer pulse duration permits deeper penetration of ions into the material surface.
Keywords
"Films","Surface treatment","Batch production systems","Ceramics","Plasmas","Soldering","Silver"
Publisher
ieee
Conference_Titel
Power Modulator and High Voltage Conference (IPMHVC), 2014 IEEE International
Print_ISBN
978-1-4673-7323-4
Type
conf
DOI
10.1109/IPMHVC.2014.7287314
Filename
7287314
Link To Document