• DocumentCode
    3667371
  • Title

    Fabrication and evaluation of tunable submicron-thick monocrystalline silicon grating for integration on LSI circuit

  • Author

    T. Sasaki;S. Chernroj;H. Matsuura;K. Hane

  • Author_Institution
    Dept. of Nanomechanics, Tohoku University, Sendai, Japan
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We present a fabrication process and characteristics of tunable submicron-thick monocrystalline silicon grating for integration of LSI wafer. The grating structure was successfully fabricated. The ribbon of the grating was successfully actuated. The rise time of step response was about 20 μs.
  • Keywords
    "Large scale integration","Gratings","Silicon","Substrates","Polymers","Fabrication","Electrodes"
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS and Nanophotonics (OMN), 2015 International Conference on
  • ISSN
    2160-5033
  • Print_ISBN
    978-1-4673-6834-6
  • Electronic_ISBN
    2160-5041
  • Type

    conf

  • DOI
    10.1109/OMN.2015.7288876
  • Filename
    7288876
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3667371