• DocumentCode
    3667901
  • Title

    Thermal simulation of nanosecond laser annealing of 3D sequential VLSI

  • Author

    Benoît Mathieu;Claire Fenouillet-Beranger;Sébastien Kerdiles;Jean-Charles Barbé

  • Author_Institution
    Univ. Grenoble Alpes, CEA, LETI, MINATEC Campus, France
  • fYear
    2015
  • Firstpage
    104
  • Lastpage
    107
  • Abstract
    A framework for the simulation of nanosecond laser annealing of structures found in 3D sequential integration is presented. The framework includes a finite difference frequency domain Maxwell solver and a Poisson solver for the thermal diffusion. Simple applications illustrate the advantages, expected difficulties and optimization levers of this annealing technique.
  • Keywords
    "Silicon","Optical films","Transistors","Temperature","Optical refraction","Optical variables control","Three-dimensional displays"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-7858-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.2015.7292269
  • Filename
    7292269
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3667901