DocumentCode :
3667904
Title :
Advanced methodology for fast 3-D TCAD electrothermal simulation of power HEMTs including package
Author :
Aleš Chvála;Daniel Donoval;Marián Molnár;Juraj Marek;Patrik Príbytný
Author_Institution :
Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, 812 19, Slovakia
fYear :
2015
Firstpage :
116
Lastpage :
119
Abstract :
This paper introduces an advanced methodology for fast 3-D TCAD electrothermal simulation for the analysis of complex power devices including package and cooling assemblies. The proposed methodology is based on coupling a 3-D finite element method (FEM) thermal model of the package, 3-D FEM electrical model of the metallization layers and circuit electrical model using a mixed-mode setup in Synopsys TCAD Sentaurus environment. This approach combines the speed and accuracy, and couples temperature and current density nonuniformity in structure and metallization layers. A power InAlN/GaN high-electron mobility transistor (HEMT) is used to perform validation of the designed electrothermal simulation. The simulation results are compared with measured data and 2/3-D FEM simulations. The low time consuming simulation approach helps to optimize more complex power structures and systems including all main fabrication parameters from semiconductor layers, metallization, package, and up to cooling assemblies.
Keywords :
"Integrated circuit modeling","Solid modeling","HEMTs","MODFETs","Finite element analysis","Logic gates","Metallization"
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN :
1946-1569
Print_ISBN :
978-1-4673-7858-1
Type :
conf
DOI :
10.1109/SISPAD.2015.7292272
Filename :
7292272
Link To Document :
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