DocumentCode :
3667907
Title :
Full-quantum study of AlGaN/GaN HEMTs with InAlN back-barrier
Author :
Luca Lucci;Jean-Charles Barbé;Marco Pala
Author_Institution :
CEA Leti, MINATEC Campus, 17, rue des Martyrs, F-38054, Grenoble, France
fYear :
2015
Firstpage :
128
Lastpage :
131
Abstract :
A full-quantum simulation of the electron transport in the two-dimensional electron gas (2DEG) of a AlGaN/GaN/InAlN/GaN heterostructure is carried out using the non-equilibrium Green function (NEGF) approach. The introduction of the InAlN back-barrier and the use of a ultra-thin GaN layer for the charge transport considerably entangles the physics of the device. A full-quantum approach is then deemed necessary to shed light on the transport properties of these devices. Gate-length and channel-thickness scaling are studied to assess the impact of confinement effects on the elctrostatic integrity of the device.
Keywords :
"Gallium nitride","Logic gates","Wide band gap semiconductors","HEMTs","MODFETs","Aluminum gallium nitride","Aluminum nitride"
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN :
1946-1569
Print_ISBN :
978-1-4673-7858-1
Type :
conf
DOI :
10.1109/SISPAD.2015.7292275
Filename :
7292275
Link To Document :
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