DocumentCode
3667948
Title
The role of the interface reactions in the electroforming of redox-based resistive switching devices using KMC simulations
Author
Elhameh Abbaspour;Stephan Menzel;Christoph Jungemann
Author_Institution
Institute of Electromagnetic Theory, RWTH Aachen University, 52056, Germany
fYear
2015
Firstpage
293
Lastpage
296
Abstract
In this paper we apply a physical model based on kinetic Monte Carlo (KMC) simulations to investigate the electroforming process of ReRAMs. In this model the electric current through the oxide is assisted by oxygen vacancies which are generated at the anode-oxide interface and introduced into the oxide. The major driving forces that control these processes are the electric field, temperature and temperature gradient. Transient simulation on short timescales was done to obtain the forming time as a function of the voltage pulse amplitude.
Keywords
"Switches","Electrodes","Hafnium compounds","Electron traps","Mathematical model","Simulation","Physics"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4673-7858-1
Type
conf
DOI
10.1109/SISPAD.2015.7292317
Filename
7292317
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