Numerical simulation of percolation model for time dependent dielectric breakdown (TDDB) under non-uniform trap distribution

We propose a TDDB model which can predict the breakdown time distributions when the trap distribution in the oxide is “non-uniform”. This is an extension of the conventional cell-based model that has been limited to the case of uniform trap distribution. The verification of the proposed model is conducted by comparing it with the Monte Carlo simulation. It turns out that the proposed model successfully reproduce the MC simulation result for various trap profiles including the cases of a high-K gate stack and a BEOL oxide. Since the model can be coupled with more realistic trap generation models, more accurate predictions based on the rigorous physics may possible including the percolation theory and oxide degradation models.