DocumentCode :
3667977
Title :
A moving mesh method for device simulation
Author :
Koichi Fukuda;Hidehiro Asai;Junichi Hattori;Hiroo Koshimoto;Tsutomu Ikegami
Author_Institution :
National Institute of Advanced Industrial Science and Technology (AIST), Japan
fYear :
2015
Firstpage :
409
Lastpage :
412
Abstract :
A moving mesh method for semiconductor device simulation is developed which effectively compromises accuracies without increasing mesh number. In this method, mesh positions are shifted referring to the solution of the previous bias condition, or to the Newton corrections. The method is applied to solve PN-junctions and MOSFETs. The method provides an effective way to cover the changes of carrier distributions depending on bias conditions. The algorithm is simple and effective, and can be widely used.
Keywords :
"Junctions","Accuracy","MOSFET","Semiconductor process modeling","Predictive models","Impurities"
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN :
1946-1569
Print_ISBN :
978-1-4673-7858-1
Type :
conf
DOI :
10.1109/SISPAD.2015.7292347
Filename :
7292347
Link To Document :
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