DocumentCode :
3671976
Title :
Impact of temperature on electromigration lifetime extrapolation
Author :
R. L. de Orio
Author_Institution :
School of Electrical and Computer Engineering, UNICAMP, Av. Albert Einstein 400, sala 206, bloco A, 13083-852 Campinas - SP, Brazil
fYear :
2015
Firstpage :
1
Lastpage :
4
Abstract :
The extrapolation of EM lifetimes obtained from high temperature tests to lower temperatures is investigated. It is shown that the usual extrapolation method leads to large errors for the predicted lifetimes at temperatures closer to the real operating conditions. A different approach for estimating the extrapolation parameters is discussed, where the results show significantly smaller errors. Thus, the reliability of interconnects regarding electromigration failures is more precisely assessed.
Keywords :
Lead
Publisher :
ieee
Conference_Titel :
Microelectronics Technology and Devices (SBMicro), 2015 30th Symposium on
Type :
conf
DOI :
10.1109/SBMicro.2015.7298125
Filename :
7298125
Link To Document :
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