• DocumentCode
    3676175
  • Title

    Propagation and scattering in a microwave plasma chamber

  • Author

    Eric Peterson;Vijay Katta;Jayanti Venkataraman;Merritt Funk;Megan Doppel;Jianping Zhao

  • Author_Institution
    Department of Electrical and Microelectronic Engineering, Rochester Institute of Technology (RIT), NY, 14623, USA
  • fYear
    2015
  • fDate
    7/1/2015 12:00:00 AM
  • Firstpage
    280
  • Lastpage
    281
  • Abstract
    The paper presents the analysis of propagation and scattering in a microwave plasma chamber. The chamber consists of a looped circular waveguide with the TE11 mode excited by the TE10 mode from a linear rectangular waveguide. The microwave power extracted through a slit along the cavity wall that is lined by quartz permeates the oxygen injected in the center and ionized by 50,000 volts hence creating plasma. The complexity of the scattering of the field through the quartz and propagating in the plasma provides several challenges to obtaining a uniform field distribution within the chamber. A nonlinear Drude model of the plasma in CST (Computer Simulation Technology) has been developed to analyze the scattered field in the plasma region.
  • Keywords
    "Plasmas","Electric fields","Microwave technology","Rectangular waveguides","Cavity resonators","Microwave propagation"
  • Publisher
    ieee
  • Conference_Titel
    Antennas and Propagation & USNC/URSI National Radio Science Meeting, 2015 IEEE International Symposium on
  • Type

    conf

  • DOI
    10.1109/APS.2015.7304526
  • Filename
    7304526