DocumentCode
3676175
Title
Propagation and scattering in a microwave plasma chamber
Author
Eric Peterson;Vijay Katta;Jayanti Venkataraman;Merritt Funk;Megan Doppel;Jianping Zhao
Author_Institution
Department of Electrical and Microelectronic Engineering, Rochester Institute of Technology (RIT), NY, 14623, USA
fYear
2015
fDate
7/1/2015 12:00:00 AM
Firstpage
280
Lastpage
281
Abstract
The paper presents the analysis of propagation and scattering in a microwave plasma chamber. The chamber consists of a looped circular waveguide with the TE11 mode excited by the TE10 mode from a linear rectangular waveguide. The microwave power extracted through a slit along the cavity wall that is lined by quartz permeates the oxygen injected in the center and ionized by 50,000 volts hence creating plasma. The complexity of the scattering of the field through the quartz and propagating in the plasma provides several challenges to obtaining a uniform field distribution within the chamber. A nonlinear Drude model of the plasma in CST (Computer Simulation Technology) has been developed to analyze the scattered field in the plasma region.
Keywords
"Plasmas","Electric fields","Microwave technology","Rectangular waveguides","Cavity resonators","Microwave propagation"
Publisher
ieee
Conference_Titel
Antennas and Propagation & USNC/URSI National Radio Science Meeting, 2015 IEEE International Symposium on
Type
conf
DOI
10.1109/APS.2015.7304526
Filename
7304526
Link To Document