DocumentCode
3677309
Title
Heavily phosphorous-doped Germanium thin films for mid-infrared plasmonics
Author
J. Frigerio;L. Baldassarre;E. Sakat;A. Samarelli;K. Gallacher;M. Fischer;D. Brida;D.J. Paul;G. Isella;P. Biagioni;M. Ortolani
Author_Institution
L-Ness, Dipartimento di Fisica, Politecnico di Milano, Polo di Como, Como, Italy
fYear
2015
Firstpage
94
Lastpage
95
Abstract
Heavily doped Ge thin films grown on different substrates have been investigated by infrared (IR) reflectometry. Screened plasma frequency and losses have been determined to assess the possibilities and limitations of Ge for mid infrared plasmonic.
Keywords
"Substrates","Reflectometry","Plasmons","Reflectivity"
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2015 IEEE 12th International Conference on
Type
conf
DOI
10.1109/Group4.2015.7305964
Filename
7305964
Link To Document