DocumentCode
3677316
Title
Development of silicon nitride arrayed waveguide grating by physical vapor deposition at room temperature
Author
Papichaya Chaisakul;Ziyi Zhang;Moloki Yako;Delphine Marris-Morini;Laurent Vivien;Naoyuki Kawai;Kazumi Wada
Author_Institution
Department of Materials Engineering, the University of Tokyo. Hongo 7-3-1 Bunkyo-ku, Tokyo 113-8656. Japan
fYear
2015
Firstpage
104
Lastpage
105
Abstract
We designed and fabricated SiN4-based AWG using physical vapor deposition technique at room temperature, compatible with low thermal budget over a wide application range. Preliminary results indicate filtering performances capable of dense WDM on a chip.
Keywords
"Arrayed waveguide gratings","Silicon","Optical filters","Optical device fabrication","Optical crosstalk","Optical receivers"
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2015 IEEE 12th International Conference on
Type
conf
DOI
10.1109/Group4.2015.7305971
Filename
7305971
Link To Document