DocumentCode :
3677325
Title :
Optical coupling between SiOxNy waveguide and Ge mesa structures for bulk-Si photonics platform
Author :
Kota Okazaki;Hidetaka Nishi;Tai Tsuchizawa;Tatsurou Hiraki;Yasuhiko Ishikawa;Kazumi Wada;Tsuyoshi Yamamoto;Koji Yamada
Author_Institution :
NTT Nanophotonics Center, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan
fYear :
2015
Firstpage :
122
Lastpage :
123
Abstract :
We successfully confirmed controllable optical coupling between a germanium mesa on a bulk-silicon wafer and a low-loss silicon oxynitride waveguide. This coupling structure can be adopted for constructing various active devices on a CMOS-process-friendly bulk-silicon photonics platform.
Keywords :
"Optical waveguides","Photonics","Optical coupling","Optical device fabrication","Silicon","Optical surface waves","Couplings"
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2015 IEEE 12th International Conference on
Type :
conf
DOI :
10.1109/Group4.2015.7305980
Filename :
7305980
Link To Document :
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