• DocumentCode
    3679193
  • Title

    Silicon Demonstration of Statistical Post-Production Tuning

  • Author

    Yichuan Lu;Kiruba Subramani;He Huang;Nathan Kupp;Yiorgos Makris

  • Author_Institution
    Univ. of Texas at Dallas, Richardson, TX, USA
  • fYear
    2015
  • fDate
    7/1/2015 12:00:00 AM
  • Firstpage
    628
  • Lastpage
    633
  • Abstract
    Towards meeting the continued demand for higher performance in analog/RF ICs, the semiconductor industry has resorted to aggressive design styles. In conjunction with the increased variation of modern processes, aggressive design jeopardizes yield and, by extension, profitability of the design. In an effort to facilitate aggressive high-performance design without compromising production yield, modern designs incorporate tuning knobs which are used after manufacturing to individually calibrate the performances of each chip, as well as some type of non-volatile memory to store the selected knob settings. In this work, we discuss a statistical post-production tuning method, which rapidly selects the appropriate knob positions using low-cost measurements, and we demonstrate it on a tunable Low Noise Amplifier which we designed and fabricated in IBM´s 130nm RF CMOS process.
  • Keywords
    "Performance evaluation","Tuning","Testing","Calibration","Radio frequency","Semiconductor device measurement","Noise"
  • Publisher
    ieee
  • Conference_Titel
    VLSI (ISVLSI), 2015 IEEE Computer Society Annual Symposium on
  • Type

    conf

  • DOI
    10.1109/ISVLSI.2015.50
  • Filename
    7309643