DocumentCode
3679193
Title
Silicon Demonstration of Statistical Post-Production Tuning
Author
Yichuan Lu;Kiruba Subramani;He Huang;Nathan Kupp;Yiorgos Makris
Author_Institution
Univ. of Texas at Dallas, Richardson, TX, USA
fYear
2015
fDate
7/1/2015 12:00:00 AM
Firstpage
628
Lastpage
633
Abstract
Towards meeting the continued demand for higher performance in analog/RF ICs, the semiconductor industry has resorted to aggressive design styles. In conjunction with the increased variation of modern processes, aggressive design jeopardizes yield and, by extension, profitability of the design. In an effort to facilitate aggressive high-performance design without compromising production yield, modern designs incorporate tuning knobs which are used after manufacturing to individually calibrate the performances of each chip, as well as some type of non-volatile memory to store the selected knob settings. In this work, we discuss a statistical post-production tuning method, which rapidly selects the appropriate knob positions using low-cost measurements, and we demonstrate it on a tunable Low Noise Amplifier which we designed and fabricated in IBM´s 130nm RF CMOS process.
Keywords
"Performance evaluation","Tuning","Testing","Calibration","Radio frequency","Semiconductor device measurement","Noise"
Publisher
ieee
Conference_Titel
VLSI (ISVLSI), 2015 IEEE Computer Society Annual Symposium on
Type
conf
DOI
10.1109/ISVLSI.2015.50
Filename
7309643
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