DocumentCode
3682901
Title
High Frequency InGaAs Nanowire MOSFETs
Author
E. Lind
Author_Institution
Dept. of Electr. &
fYear
2015
Firstpage
1
Lastpage
4
Abstract
We present compact modeling, DC and RF characterization of lateral and vertical nanowire MOSFETs. Lateral tri-gate nanowire devices on InP substrates have demonstrated a maximum gm=2.95 mS/μm at VDS=0.5 V, and fT/fmax=290/350 GHz. Vertical gate-all-around InAs wires integrated on Si substrates have demonstrated gm=1.35 mS/μm and fT/fmax=100/155 GHz. We also demonstrate a non-parabolic, ballistic charge/current compact model for rectangular nanowire FETs.
Keywords
"Logic gates","Nanoscale devices","Wires","MOSFET","Capacitance","Substrates"
Publisher
ieee
Conference_Titel
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2015 IEEE
Type
conf
DOI
10.1109/CSICS.2015.7314508
Filename
7314508
Link To Document