DocumentCode
3688031
Title
Sol-gel imprint lithography for guided mode resonance structures
Author
Yin Huang;Longju Liu;Benjamin Ch´ng;Meng Lu
Author_Institution
Department of Electrical and Computer Engineering, Iowa State University, Ames, 50011, USA
fYear
2015
Firstpage
367
Lastpage
368
Abstract
A sol-gel based imprint lithography process has been developed to fabricate guided-mode resonance (GMR) structures. The inexpensive process offers a rapid means to create sub-micron grating waveguide structures over large surface areas. Both one-dimensional and two-dimensional GMR devices have been successfully fabricated and characterized.
Keywords
"Optical device fabrication","Glass","Dielectrics","Optical waveguides","Gratings"
Publisher
ieee
Conference_Titel
Photonics Conference (IPC), 2015
ISSN
1092-8081
Type
conf
DOI
10.1109/IPCon.2015.7323457
Filename
7323457
Link To Document