• DocumentCode
    3689030
  • Title

    New layout design methodology for monolithically integrated 3D CMOS logic circuits based on parasitics engineering

  • Author

    Chika Tanaka;Keiji Ikeda;Masumi Saitoh

  • Author_Institution
    Toshiba Corporation, Advanced LSI Technology Laboratory, Corporate R&
  • fYear
    2015
  • Firstpage
    258
  • Lastpage
    261
  • Abstract
    We propose a new layout design methodology for monolithically integrated 3D CMOS logic circuits based on parasitics engineering. In order to understand the impact of parasitics in monolithic 3D-stacked CMOS circuits, careful analysis of intra- and inter- layer parasitic capacitances were performed by using physics-based RC extractor for realistic 3D structure. As a result, we found that separation of power-supply (Vdd) and ground-line (GND) layer from logic elements is a key to reduce the parasitic capacitance thanks to be suppressed electrical coupling between stacked layers. By comparative evaluation among possible 3D layer configurations, we revealed that the best configuration is Vdd and GND layer sandwiched between nFET and pFET logic layers. Performance benchmarking by energy consumption-switching delay demonstrated that a 40% improvement of energy-delay product at Vdd = 0.5 V can be achieved by using a proposed layout methodology.
  • Keywords
    "Logic gates","Layout","Three-dimensional displays","Parasitic capacitance","CMOS integrated circuits","Delays"
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference (ESSDERC), 2015 45th European
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4673-7133-9
  • Electronic_ISBN
    2378-6558
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2015.7324763
  • Filename
    7324763